A Carpet Cloak Device For Visible Light

We report an invisibility carpet cloak device which is capable of making an object undetectable by visible light.

A carpet cloak device for visible light.

We report a cloak device that makes objects undetectable by visible light. Viewed from any other angle the object would remain visible. The spatial index variation is realized by etching holes of various sizes in. It is designed using conformal mapping and is fabricated in silicon nitride waveguide on nano porous silicon oxide substrate with very low refractive index.

The cloak is designed using quasi conformal mapping and is fabricated in a silicon nitride waveguide on a specially developed nanoporous silicon oxide substrate with a very low refractive index n less than 1 25. We report an invisibility carpet cloak device which is capable of making an object undetectable by visible light. A carpet cloak for visible light. A crystalline silicon wafer is electro.

Previous devices have been able to hide objects from light travelling in only one direction. We report an invisibility carpet cloak device which is capable of making an object undetectable by visible light. The cloak described in the journal science hid an object from detection using light of wavelengths close to those that are visible to humans. Additionally an area ofconstanthole size surrounding the cloak device is required to provide a uniform background index.

The carpet cloak. The cloak is designed using quasi conformal mapping and is fabricated in a silicon nitride waveguide on a specially developed nanoporous silicon oxide substrate with a very low refractive index n 1 25. The cloak is designed using quasi conformal mapping and is fabricated in a silicon nitride waveguide on a specially developed nano porous silicon oxide substrate with a very low refractive index. Invisibility carpet cloak can hide objects from visible light 15 june 2011 by lisa zyga when an input beam black arrow reflects off a a bump without a cloak the bump causes a perturbation.

The device fabrication process begins with the preparation of the low index substrate.